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    • 专利摘要:
    A memory array comprising: a first volatile memory cell (202) having first and second inverters (206, 208) cross-coupled between first and second storage nodes (210, 212); a first non-volatile memory cell (204) having at least one resistive element (218, 218A, 218B) programmable to take one of at least two resistive states (Rmin, Rmax); a control circuit (224) adapted to couple the first non-volatile memory cell to the first and second storage nodes to generate a current for programming the resistive state of said at least one resistive element.
    公开号:FR3016466A1
    申请号:FR1450198
    申请日:2014-01-10
    公开日:2015-07-17
    发明作者:Virgile Javerliac；Christophe Layer
    申请人:Centre National de la Recherche Scientifique CNRS；Commissariat a lEnergie Atomique CEA；Commissariat a lEnergie Atomique et aux Energies Alternatives CEA；
    IPC主号:
    专利说明:

    [0001] B13004 - BD14825 - D106608-01 1 METHOD AND CIRCUIT FOR PROGRAMMING NON-VOLATILE MEMORY RW.TTInas OF VOLATILE / NON-VOLATILE MEMORY MATRIX Domain This description relates to the field of memory networks, and in particular to a memory array combining a storage of volatile data and non-volatile data. BACKGROUND It has already been proposed to use programmable resistive elements in memory cells to ensure nonvolatile data storage. Such resistive elements 10 are programmable to take one of two different resistive states. The programmed resistive state is maintained even when a supply voltage of the memory cell is disconnected, and thus data can be stored by such elements in a non-volatile manner. Various types of resistive elements have been proposed, some of which are capable of being programmed by the direction of a current passed through the resistive element. An example of such a current-programmable resistive element is an STT (spin transfer torque) element, which is based on magnetic tunnel junctions (MTJ). 'B13004 - BD14825 - D106608-01 2 A difficulty in using resistive elements for data storage is that read and write operations tend to be relatively slow, resulting in access time high compared to a standard volatile memory such as SRAM (Random Access Random Access Memory). To solve this problem, it has been proposed to provide, in each memory cell, a circuit for programming the state of the resistive element and for reading, amplifying and memorizing a programmed resistive state. However, although such a solution leads to improved access times, the area used by each memory cell and the power consumption tend to be high. There is therefore a need in the art for a nonvolatile memory array having relatively low access times and / or a reduced area compared to existing nonvolatile memories. SUMMARY An object of embodiments of the present disclosure is to at least partially solve one or more needs of the prior art. In one aspect, there is provided a memory array comprising: a first volatile memory cell having first and second inverters cross-coupled between first and second storage nodes; a first nonvolatile memory cell having at least one programmable resistive element for taking one of at least two resistive states; and a control circuit adapted to couple the first non-volatile memory cell to the first and second storage nodes to generate a current for programming the resistive state of said at least one resistive element. According to one embodiment, said at least one resistive element is programmable by the direction of a current passed through it to take one of said at least two resistive states. According to one embodiment, the first non-volatile memory cell comprises first and second input nodes, and the control circuit is adapted to couple the first non-volatile memory cell to the first non-volatile memory cell. and second storage nodes by coupling the first input node to the first storage node and coupling the second input node to the second storage node. According to one embodiment, the non-volatile memory cell comprises a single resistive element coupled in series with a first transistor between the first and second input nodes. According to one embodiment, the control circuit is adapted to couple the first non-volatile memory cell to the first and second storage nodes by activating the first transistor. According to one embodiment, the nonvolatile memory cell comprises: a first resistive element coupled in series with a second transistor between the first input node and a first voltage level; and a second resistive element coupled in series with a third transistor between the second input node and the first voltage level. According to one embodiment, the first volatile memory cell comprises: a fourth transistor coupled between the first storage node and the first input node of the non-volatile memory cell; a fifth transistor coupled between the second storage node and the second input node of the non-volatile memory cell, and the control circuit is adapted to couple the first non-volatile memory cell to the first and second storage nodes; activating the fourth and fifth transistors. According to one embodiment, the first input node is connected to a first bit line; the second input node is connected to a second bit line; the first storage node is coupled to the first 4-bit line through the fourth transistor; and the second storage node is coupled to the second bit line through the fifth transistor. According to one embodiment, the first input node is connected to a first internal node; the second input node is connected to a second internal node; the first storage node is coupled to the first internal node via the fourth transistor; the second storage node is coupled to the second internal node 10 via the fifth transistor; the first internal node is coupled to a first bit line through a sixth transistor; the second internal node is coupled to a second bit line through a seventh transistor; and the control circuit 15 is adapted to deactivate the sixth and seventh transistors during coupling of the first non-volatile memory cell to the first and second storage nodes. According to one embodiment, the memory array further comprises: a second volatile memory cell 20 having third and fourth inverters cross-coupled between third and fourth storage nodes, the third storage node being coupled to the first internal node via an eighth transistor and the fourth storage node being coupled to the second internal node via a ninth transistor; and a second non-volatile memory cell comprising: at least one programmable resistive element for taking one of at least two resistive states; a third input node connected to the first internal node; and a fourth input node connected to the second internal node. According to one embodiment, the memory matrix further comprises a read / write circuit adapted to read in the first non-volatile memory cell a programmed resistive state representing a first data bit and to write the first data bit in the first volatile memory cell. According to one embodiment, each of the volatile memory cells is coupled to a voltage supply rail coupled through a switch at a supply voltage level. According to one embodiment, said at least one resistive element of each of the nonvolatile memory cells is of one of the following types: a spin transfer torque element having anisotropy in the plane; a spin transfer torque element having anisotropy perpendicular to the plane; and a redox element. In another aspect, there is provided a method for backing up data in the aforementioned memory array, the method comprising: coupling, by a control circuit, the first non-volatile memory cell to the first and second storage nodes to generate a current for program the resistive state of said at least one resistive element. In another aspect, there is provided a method of restoring data in the aforementioned memory array, the method comprising: reading in the first nonvolatile memory cell a programmed resistive state representing a first data bit; and writing the first data bit into the first volatile memory cell.
    [0002] BRIEF DESCRIPTION OF THE DRAWINGS The above-mentioned and other features and advantages will be apparent from the following detailed description of embodiments, given by way of illustration and not limitation, with reference to the accompanying drawings, in which: Figure 1 schematically illustrates an example of a nonvolatile flip-flop; Figure 2 schematically illustrates a portion of a nonvolatile / volatile memory array according to an exemplary embodiment; FIG. 3 schematically illustrates a nonvolatile memory cell according to an exemplary embodiment; FIG. 4 schematically illustrates an arrangement of volatile and non-volatile memory cells according to another embodiment; FIG. 5 schematically illustrates an arrangement of volatile and non-volatile memory cells according to exemplary embodiments; Figure 6 schematically illustrates a volatile memory cell in more detail according to an exemplary embodiment; FIG. 7A schematically illustrates a non-volatile / volatile memory device according to an exemplary embodiment; Figure 7B schematically illustrates in more detail a column multiplexer of the memory device of Figure 7A according to an exemplary embodiment; Fig. 8 is a timing chart showing exemplary signals in the memory array of Fig. 7A according to an exemplary embodiment; Figure 9 schematically illustrates a non-volatile / volatile memory device according to another embodiment; and Fig. 10 is a timing chart showing exemplary signals in the memory device of Fig. 9 according to an exemplary embodiment. Detailed Description In the following description, the "connected" telme is used to refer to a direct connection between one element and another, while the term "coupled" implies that the connection between the two elements may be direct, or through an intermediate element, such as a transistor, resistor or other component. Figure 1 substantially reproduces Figure 7 of the publication entitled "Spin-MTJ based Non-Volatile Flip-Flop", B13004-BD14825-D106608-01 7 Weisheng Zhao et al., Proceedings of the 7th IEEE International Conference on Nanotechnology, August 2-5, 2007, Hong Kong. The flip-flop 100 shown in FIG. 1 comprises a master register and a slave register (SLAVE REGISTER). The master register includes magnetic tunnel junction devices MTJ1 and MTJO, programmable by the direction of a current being passed therethrough. The MTJ1 device is connected between an intermediate node 104 and an interconnection node 102. The MTJO device is connected between an intermediate node 106 and the interconnection node 102. The interconnection node 102 connects MTJ MTJO devices with each other. MTJ1. The intermediate node 104 is further coupled to a supply voltage Vdd via a pair of series-coupled transistors MN1 and MP1 forming a first inverter. The intermediate node 106 is further coupled to the supply voltage Vdd via a pair of MPO and MNO transistors coupled in series and forming a second inverter. The first and second inverters are coupled to each other crosswise, and the output of the second inverter is connected to the slave register. A transistor MN2 is coupled between the gate nodes of the transistors MN1 and MNO. An MN5 transistor is coupled between the intermediate node 104 and the supply voltage Vdd, and a transistor MN6 is coupled between the intermediate node 104 and the ground. In addition, a transistor MN3 is coupled between the intermediate node 106 and the supply voltage Vdd, and a transistor MN4 is coupled between the intermediate node 106 and the ground. An MN7 transistor is coupled between the intermediate node 102 and the ground. The transistors MN3 to MN6 allow a current to flow through the resistive elements MJ11 and MTJO in one direction or the other in order to program the resistive states of the MTJ devices. During this programming phase, the transistor MN7 is used to disconnect the node 102 from the ground. Two non-OR gates and an inverter on the left-hand side of FIG. 1, which are controlled by an input signal 'B13004 - BD14825 - D106608-01 8 INPUT, a clock signal Clk and a signal d' EN activation, generate signals to control the transistors MN3 to MN6. When the transistor MN7 is activated, the transistors MPO, MP1, MNO and MN1 form a sense amplifier for reading the states of the elements MTJO and MTJ1. The memory cell forming the master register of Figure 1 is not suitable for use in a memory array in view of its relatively high number of transistors. In addition, the transistors constituting the sense amplifier are relatively large, since they must be able to pass a current sufficient to allow the resistive states of the MTJO and MTJ1 elements to be detected. FIG. 2 diagrammatically illustrates a circuit 200 associated with a column of a non-volatile / volatile combined memory matrix according to an exemplary embodiment of the present description. The circuit 200 comprises a volatile memory cell 202, and a nonvolatile memory cell 204 associated with the volatile memory cell 202. As will become clear hereinafter, the volatile and non-volatile memory cells are associated with one another. at least some of the time, the nonvolatile memory cell 204 stores a backup of a data bit held by the volatile memory cell 202, and can be used to restore that data bit in the cell In the example of FIG. 2, the memory cells 202, 204 are coupled between the same pair of bit lines BL, BLB. Although FIG. 2 illustrates a single volatile memory cell 202 and a single non-volatile memory cell 204, the column may include any number of volatile cells and associated nonvolatile cells coupled between the BL and BLB bit lines. In addition, although only one column is illustrated in FIG. 2, the memory array may comprise any number of columns of the type B13004-9 shown in FIG. 2, each having a corresponding read / write circuit described in more detail. below. The volatile memory cell 202 is, for example, an SRAM cell (static random access memory), comprising a flip-flop formed by two inverters 206, 208 cross-coupled between memory blocks 210, 212. A transistor 214, which is for example a PMOS transistor, couples the storage node 210 to the bit line BL. A transistor 216, which is also by. For example, a PMOS transistor couples the storage node 212 to the bit line BLB. Transistors 214 and 216 are for example controlled by a row selection line WLA.deda: memory array. The non-volatile memory cell 204 includes, for example, a programmable resistive element 218 coupled in series with a transistor 220, which is for example a PMOS transistor, between nodes 221, 222 of the cell. In the example of FIG. 2, these input nodes 221, 222 are connected to the bit lines BL and BLB respectively. The transistor 220 is for example controlled by a row selection line WLB of the memory array. The resistive element 218 is for example a resistance switching element of any type for which the resistance is programmable by the direction of a current passed through. The resistive element 218 is for example an STT (spin torque transfer) element having anisotropy in the plane: or perpendicular to the plane, as described in more detail in the publication entitled "Magnonic spintransfer torquellRAM with low power , high speed, and error-free switching ".N..Mojumder-et.al., IEDM Tech. Digest (2010), and in the publication. entitled: "Electric toggling of magnets", E. Tsymbal, iqatural: Materials. Vol. 11, January 2012. Alternatively, the resistive elements could be those used in RAM RedOx (Redox RAM) type resistance memories, which are for example described in more detail in the publication. "Switching Memories - Nanoionic Mechanisms, Prospects and Challenges", Rainer Waser et al., Advanced Materials 2009, 21, pages 2632 to 2663. Whatever the type of resistive element, a data bit is for example stored in a non-volatile manner by programming the element so as to have either a relatively high resistance (Rmax) or a relatively low resistance (Rmin) - the resistive element 218 for example has only two resistive states corresponding to the high and low resistors Rmax and Rmin, but the exact values of Rmin and Rmax may vary depending on conditions such as the manufacturing process, materials, temperature variations, etc. The resistive element 218 is for example chosen so that the resistance Rmax is always significantly greater than Rmin, for example greater than at least 20 percent. In general, the ratio between the resistance Rmax and the resistance Rmin is for example between 1.2 and 10000. Rmin is for example of the order of 2 kilo-ohms or less, and Rmax is for example of the order of 6 kilo-ohms or more, although many other values are possible. The bit lines BL and BLB are coupled to a read / write circuit (READ / WRITE) 223. A control circuit 224 provides control signals on a line 226 to the read / write circuit 223, and to the control lines. WLA and WLB selection. The read / write circuit 223 is capable of reading a data bit in the volatile memory cell 202, for example by pre-charging the BL and BLB bit lines with a high voltage, and detecting a voltage drop on the one or the other of the bits when the WLA signal is activated by the control circuit 224. The read / write circuit 223 is also able to read a data bit in the non-volatile memory cell 204, for example by applying a voltage between the bit lines BL, BLB while the signal WLB is activated by the control circuit 224, in order to generate a current in the resistive element 218. The level of this current is for example compared to a reference current to determine the programmed resistive state of the element 218. The data read in the non-volatile memory cell 202 or the volatile memory cell 204 may be provided as a signal q at level d an output of the read / write circuit 223, and / or written to one of the volatile memory cells during a restore operation, as will be explained in more detail.
    [0003] During a backup phase, the control circuit 224 is capable of controlling the volatile and nonvolatile memory cells of the array so that data is transferred from the volatile memory cell 202 to the associated nonvolatile memory cell 204 In particular, the control circuit 224 activates the selection signals WLA and WLB, so that the transistors 214, 216 and 220 of the memory cells 202 and 204 are activated. The storage nodes 210, 212 are thus respectively coupled to the input nodes 221, 222 of the nonvolatile memory cell 204, and a write current will flow in one direction or the other through the resistive element. 218 to program its state, according to the data maintained by the storage nodes 210, 212. Depending on the type and dimensions of the resistive element 218, the size of the transistors constituting the inverters 206, 208 of the memory cell 202 is for example chosen so as to generate a write current of the order of 10 to 500 pA. The read / write circuit 223 is also capable of writing a data bit into the volatile memory cell 202 via bit lines BL and BLB. This datum may be an external datum dext supplied to the read / write circuit 223, or an internal datum read in one of the other memory cells, for example the volatile memory cell 202. For example, during a restoration phase, a The data bit is read by the read / write circuit 223 in the nonvolatile memory cell 204, and is written to the volatile memory cell 202. The write operation involves application by the read / write circuit 223 of a high voltage on the bit line BL and a low voltage on the bit line BLB, or vice versa, depending on the data to be written. The control circuit 224 then activates the WLA signal, for example at a low level, to turn on the transistors 214, 216, so that the flip-flop of the inverters 206, 208 is programmed on the basis of the voltages on the other side. bit lines BL, BLB. Although FIG. 2 shows an example of the circuits forming the volatile and nonvolatile memory cells 202, 204, it will be clear to one skilled in the art that in alternative embodiments different circuits could be used. FIG. 3 illustrates the non-volatile memory cell 204 according to a variant embodiment with respect to that represented in FIG. 2. In particular, rather than including a single resistive element 218, the circuit of FIG. 3 comprises two resistive elements 218A. , 218B. The element 218A is coupled in series with a transistor 220A, which is for example a PMOS transistor, between the bit line BL and an intermediate supply voltage VI. Similarly, the element 218B is coupled in series with a transistor 220B, which is for example a PMOS transistor, between the bit line BLB and the intermediate supply voltage VI. For example, the resistive elements 218A and 218B each have one of their nodes coupled to the voltage V1, and the other node coupled to the corresponding bit line. As will be described in more detail below, the intermediate supply voltage VI is for example equal to or close to half the value of the supply voltage VDD. Transistors 220A, 220B are for example controlled by the selection line WLB. The nonvolatile data bit represented by the resistive elements 218A, 218B depends on which elements resistive to the resistor Rmax or Rmin, in other words relative resistances. The values of Rmax and Rmin are for example the same as for the resistive element 218 of Figure 2 described above. In FIG. 3, the resistive element 218A is shown programmed to have a resistance Rmin and the element 218B a resistor Rmax, and as represented by the references Rmax and Rmin in parentheses, the opposite programming of the resistance values would be possible. In operation, the read / write circuit 223 of FIG. 2 writes to the non-volatile memory cell 204 of FIG. 3 in the same manner as previously described in connection with FIG. 2, by activating the selection signals of row WLA and WLB. Thus the two transistors 220A and 220B will be activated, which causes the passage of currents in each of the resistive elements 218A, 218B. The high voltage on the storage node 210 or 212 is for example at a VDD level between 2 and 3 V, the low voltage on the other of the storage nodes 210, 212 is for example at ground, and the intermediate voltage VI is for example about VDD / 2, for example between 1 and 1.5 V. Thus a current will flow in each of the resistive elements 218A, 218B in a different direction depending on the data stored on the storage nodes. The read / write circuit 223 reads the relative resistive state of the resistive elements 218A, 218B by applying a voltage, for example the supply voltage VDD or the ground, to each of the bit lines BL, BLB, while the signal WLB is activated, then comparing, using a comparator, the level of current flowing to or from each bit line. FIG. 4 schematically illustrates an arrangement of volatile and nonvolatile memory cells 202, 204 according to an alternative example with respect to the arrangement of FIG. 2, in which the cells of a group of the memory cells lying in a column are coupled between internal nodes 402, 404. In the example of FIG. 4, the group of memory cells comprises two volatile memory cells 202 and two nonvolatile memory cells 204 coupled between internal nodes 402, 404. In alternative embodiments, there could be more than two volatile and nonvolatile memory cells. The internal node 402 is coupled to the bit line BL via a PMOS transistor 406, and the internal node 404 is coupled to the bit line BLB via a PMOS transistor 408. The transistors 406 , 408 are controlled by a group select signal WL1, while the memory cells respectively receive select signals WL1A, WL1B, WL1C and WL1D. Although not shown in FIG. 4, there could be other groups of volatile and nonvolatile memory cells coupled between the BL, BLB bit lines. In operation, during a read or write operation of the memory cells 202, 204, the transistors 406, 408 are activated in addition to the transistors 214, 216, or 220. However, when data is to be transferred from the one of the volatile memory cells to one of the non-volatile memory cells, the transistors 406, 408 remain disabled. In this way, such a data transfer operation can be performed at the same time in each of the groups of memory cells coupled to the same bit lines BL and BLB. FIG. 5 schematically illustrates volatile and non-volatile memory cells 202, 204 according to an alternative embodiment similar to that of FIG. 4, except that each group of memory cells comprises only two memory cells, a volatile memory cell 202 and An associated nonvolatile memory cell 204. In such an arrangement, the data bits stored by all the volatile memory cells 202 of each column of the memory array can all be transferred at the same time to their B13004 - BD14825 cells. - D106608-01 15 nonvolatile memory 204 associated. Indeed, a first group of memory cells of Figure 5 is controlled by the selection signals WL1, WL1A and WL1B, and a second group of memory cells is controlled by the selection signals WL2, WL2A and WL2B. Note that the nonvolatile memory cells 204 of Figures 4 or 5 could be implemented by the circuit of Figure 3, the transistors 220A, 220B being coupled to the internal nodes 402, 404.
    [0004] Figure 6 illustrates one of the volatile memory cells 202 in more detail according to an exemplary embodiment. The inverter 206 is for example constituted by a PMOS transistor 602 and an NMOS transistor 604 coupled in series between a supply node 605 and the ground. The control nodes of the transistors 602, 604 are coupled to the storage node 210, and an intermediate node between these transistors constitutes the storage node 212. Similarly, the inverter 208 consists for example of a PMOS transistor 606 and an NMOS transistor 608 coupled in series between the supply node 605 and the ground. The control nodes of the transistors 606, 608 are coupled to the storage node 212, and an intermediate node between these transistors constitutes the storage node 210. The supply node 605 is for example coupled to a voltage supply rail 610 which in turn is coupled to a supply voltage VDD via a PMOS transistor 612 controlled by a sleep signal SLEEP. The supply rail 610 feeds for example all the volatile memory cells of the column, and so by deactivating the transistor 612, the volatile memory cells can have their power cut off to save energy. In particular, before entering the sleep mode, the data from each of the volatile memory cells 202 are for example saved in their associated nonvolatile memory cells 204, then the volatile memory cells have their power off by disabling the memory. At the end of the sleep period, the transistor 612 is for example activated to supply the volatile memory cells 202, and the data stored by each of the nonvolatile memory cells 204 612. At the end of the sleep period, the transistor 612 is for example activated. are for example restored in their associated volatile memory cells. FIG. 7A schematically illustrates a memory device 700 comprising the circuit 200 of FIG. 2 according to an exemplary embodiment. The manner in which this device could be adapted to operate on the basis of the memory cells of FIG. 3 will be clear to those skilled in the art. Two COLO and COL1 columns are illustrated in FIG. 7, and two volatile memory cells 202 and two non-volatile memory cells 204 are illustrated in each column, although in alternative embodiments there may be any number of columns and one any number of memory cells in each column. The read / write circuit comprises a read / write module 702, and a column multiplexer (Mux pass) 704 associated with each column. Thus, in the embodiment of FIG. 7A, the read / write module 702 is associated with more than one column of the memory array. In alternative embodiments, a separate read / write module 702 could be provided for each column of the array. Figure 7B illustrates in more detail one of the multiplexers of column 704 according to an example embodiment. With reference to both FIGS. 7A and 7B, the column multiplexer 704 of the COLO column selectively couples the BL, BLB bit lines respectively to complementary write lines wd1 and nwd1 when a write signal wdec0 of the COLO column is enabled; a VDD supply voltage for precharging the bit lines before a volatile cell is read when a blprechn pre-charge signal is activated; B13004 - BD14825 - D106608-01 17 complementary volatile cell read lines rsrdl, nrsrdl, when a volatile read signal rsrdec0 of the column COLO is activated; and a non-volatile read line rsttrdl and a read voltage level, for example ground, when a non-volatile read signal rsttdec0 is activated. The column multiplexer 704 comprises, for example: two PMOS transistors controlled by the signal blprechn for respectively coupling the bit lines BL and BLB to the supply voltage VDD; two NMOS transistors controlled by the signal wdec for respectively coupling the bit lines BL and BLB to the write lines wd1 and nwdl; two NMOS transistors controlled by the signal rsrdec 15 for respectively coupling the bit lines BL and BLB to the volatile reading lines rsrdl and nrsrdl; and two NMOS transistors controlled by the signal rsttdec for respectively coupling the bit lines BL and BLB to the non-volatile reading line rsttrdl and the mass. Referring again to FIG. 7A, the read / write module 702 comprises a write circuit 706, which generates voltages to be applied to the bit lines of a selected column based on a signal of wrt write from the control block 224, and a data signal d from a data multiplexer 708. The data multiplexer 708 selects either the external dext data received from outside the memory array, or the internal dint data read from a memory cell of the array, based on a rte restore signal. The read / write module 702 also includes a comparator (Comp) 710, having positive and negative inputs respectively coupled to the volatile cell read lines nrsrdl and rsrdl. An output of the comparator 710 is coupled to a data latch (Latch) 712, which in turn provides the internal data signal dint. The comparator 710 and B12004 - BD14825 - D106608-01 18 flip-flop 712 each receive a synchronization signal compe. The internal data signal dint is provided via an output buffer 713 in the form of the output data signal q of the read / write module 702.
    [0005] The non-volatile cell read line rsttrdl is coupled to a voltage clamping circuit (clamp) 714, which applies a voltage level to the line rsttdrdl to generate a current in the resistive element of a non-memory cell. selected volatile 204. Similarly, the voltage clamping circuit 714 also applies, for example, a voltage to a refsttrd1 reference line coupled to a reference device (not shown) so that a reference current is generated. The reference device has for example a resistance equal to (Rmax + Rmin) / 2, so that the reference current provides a cut-off level to determine whether the resistive element has a programmed resistance of Rmin or Rmax. by the voltage clamping circuit 714 are converted into voltage levels and amplified by an amplifier 716. The voltage clamping circuit 714 and the amplifier 716 for example receive a synchronization signal ampe. The amplifier 716 provides differential voltage outputs, which in turn are coupled via switches 718 to the inputs of the comparator 710. The switches 718 are controlled by a nonvolatile read command signal from the control block 224. For example, a row decoder 720 is associated with each pair of volatile / non-volatile rows of the memory array. The row decoder 720 receives a row address, and when the address corresponds to the address of the row, activates the corresponding row WLA command signal when a volatile row selection signal wlsrame is activated, or enables the row corresponding row command signal WLB when a non-volatile row selection signal wlsttrame is activated.
    [0006] The control block 224 receives a clock signal clk, a row address signal Row Ad, a column address signal Col Ad, a write activation signal we , a non-volatile cell selection signal stte, a volatile cell selection signal sre, a save backup signal, and a restore signal restore. The operation of the memory 700 will now be described with reference to FIG. 8. FIG. 8 is a timing diagram illustrating examples of the signals clk, save, restore, blprechn, wlsrame, wlsttrame, rsrdecO, rsttdecO, wdecO, rte, rdstte, ampe, comp, wrt, q, dint stt and dint_sr, in the memory array 700 of FIG. 7A during a backup operation and a restore operation between the volatile and nonvolatile memory cells of the COLO column of FIG. 7A. The signal dint stt corresponds to the data stored by the non-volatile memory cell 204 and the signal dint_sr corresponds to the data stored by the volatile memory cell 202. The backup operation is triggered by a high value of the signal save, and involves the application of the selection signals wlsrame and wlsttrame volatile and non-volatile memory cells between which the transfer must take place. After a twnv write time, the wlsrame and wlsttrame signals go low, and the data dint_stt stored by the non-volatile memory cell becomes equal to the volatile data dint_sr. The restore operation is triggered by a high value of the restoration signal, and begins with a read operation of the dint_stt data stored in the nonvolatile memory cell. During the restore operation, the signal is high, so that the data written in the volatile memory cell is the internal data dint that has been read into the nonvolatile memory cell. The signal wlsttrame goes high to enable the WLB signal and select the volatile memory cell, and rsttdec0 goes high to couple the bit lines to the ground. and the read data line rsttrdl. The ampe sync signal then goes high to enable voltage clamping 714 and amplifier 716, and the comp sync signal then goes high to store the data signal in latch 712. the falling edge of the signal compe, the signal q passes to the non-volatile cell data signal dint_stt.
    [0007] The restore operation then involves a write operation in the volatile cell. Thus the signals wlsrame and wdec0 are high, and the write signal wrt also goes high. After a write time twv, which is for example shorter than the write time twnv of the nonvolatile cell 15, the wrt write signal goes to the low state, and the data dint sr stored by the cell of non-volatile memory becomes equal to the non-volatile data dint_stt. FIG. 9 schematically illustrates a memory device 900 very similar to that of FIG. 7, and the like elements bear the same references and will not be described again in detail. One difference is that the volatile and nonvolatile memory cells 202, 204 of Figure 9 are coupled in pairs, as in the embodiment of Figure 5 previously described. The row decoders receive another isoalln isolation signal indicating when a backup operation is to be performed and the memory cells must be isolated from the corresponding bit lines. Furthermore, in addition to the selection signal wlsrame and wlsttrame, another selection signal ison 30 selects one of the groups of memory cells during an operation. reading or writing volatile memory cells. The control circuit 224 further receives a signal svall indicating the moment when a save operation must be performed on all the volatile memory cells 35 of the array.
    [0008] B13004 - BD14825 - D106608-01 21 FIG. 10 is a timing diagram illustrating examples of the clk, svall, restore, isoalln, blprechn, wlsrame, wlsttrame, rsrdecO, rsttdecO, wdecO, rte, rdstte, ampe, compe, wrt, q signals. , dint stt and dint sr, in the memory array 900 of FIG. 9 during a backup operation and a restore operation between the volatile and nonvolatile memory cells of the COLO column. The difference from the timing diagram of FIG. 8 is that the svall complete backup signal triggers the save operation, and during this operation the isoalln signal is brought low to isolate the memory cells from the bit lines. . An advantage of the embodiments described herein is that, by coupling the storage nodes of a volatile memory cell to input nodes of a nonvolatile memory cell, a backup operation in which the memory cell non-volatile is written can be performed in a simple manner without using dedicated write circuit in the memory array. Furthermore, in such a circuit, a common read and / or write circuit can be provided for the volatile and non-volatile memory cells, and thus each memory cell can be implemented with relatively few transistors and no amplifier. detection. With the description thus made of at least one illustrative embodiment, various alterations, modifications and improvements will readily occur to those skilled in the art. For example, it will be clear to those skilled in the art that the VDD supply voltage in the various embodiments could be at any level, for example between 1 and 3 V, and rather than being at 0. V, the ground voltage could also be considered as a supply voltage which could have any level, such as a negative level. Furthermore, it will be clear to those skilled in the art that, in all the embodiments described herein, all NMOS transistors could be replaced by PMOS transistors and / or B12004-BD14825-D106608-01 22 all PMOS transistors could be replaced by NMOS transistors. How all these circuits could be implemented using only PMOS transistors or only NMOS transistors will be readily apparent to those skilled in the art. In addition, although transistors based on MOS technology have been described here, in alternative embodiments other transistor technologies, such as bipolar technology, could be used. In addition, it will be clear to those skilled in the art that the various elements described in connection with the various embodiments could be combined, in alternative embodiments, in any combination.
    权利要求:
    Claims (15)
    [0001]
    REVENDICATIONS1. A memory array comprising a first volatile memory cell (202) having first and second inverters (206, 208) cross-coupled between first and second storage nodes (210, 212); a first non-volatile memory cell (204) having at least one resistive element (218, 218A, 218B) programmable to take one of at least two resistive states (Rmin, Rmax); and a control circuit (224) adapted to couple the first non-volatile memory cell to the first and second storage nodes to generate a current for programming the resistive state of said at least one resistive element.
    [0002]
    The memory array of claim 1, wherein said at least one resistive element is programmable by the direction of a current passed therethrough to take one of said at least two resistive states.
    [0003]
    The memory array of claim 1 or 2, wherein the first non-volatile memory cell comprises first and second input nodes (221, 222), and wherein the control circuit (224) is adapted to couple. the first non-volatile memory cell at the first and second storage nodes by coupling the first input node (221) to the first storage node and coupling the second input node (222) to the second storage node.
    [0004]
    The memory array of claim 3, wherein the non-volatile memory cell comprises a single resistive element (218) coupled in series with a first transistor (220) between the first and second input nodes (221, 222). 30
    [0005]
    The memory array of claim 4, wherein the control circuit (224) is adapted to couple the first non-volatile memory cell to the first and second storage nodes by activating the first transistor. B13004 - BD14825 - D106608-01 24
    [0006]
    The memory array of claim 3, wherein the non-volatile memory cell comprises: a first resistive element (218A) coupled in series with a second transistor (220A) between the first input node (221) and a first voltage level (V1); and a second resistive element (218B) coupled in series with a third transistor (220B) between the second input node (222) and the first voltage level (VI).
    [0007]
    A memory array according to any one of claims 3 to 6, wherein the first volatile memory cell comprises: a fourth transistor (214) coupled between the first storage node (210) and the first input node ( 221) of the nonvolatile memory cell; A fifth transistor (216) coupled between the second storage node (212) and the second input node (222) of the non-volatile memory cell, the control circuit (224) being adapted to couple the first storage cell; nonvolatile memory at the first and second storage nodes activating the fourth and fifth transistors.
    [0008]
    The memory array of claim 7, wherein said first second first the first input node (221) is connected to a bit line (BL); the second input node (222) is connected to a bit line (BLB); the first storage node (210) is coupled to the bit line (BL) via the fourth transistor (214); and the second storage node (212) is coupled to the second bit line (BLB) via the fifth transistor (216).
    [0009]
    The memory array of claim 7, wherein: the first input node (221) is connected to a first internal node (402); the second input node (222) is connected to a second internal node (404); The first storage node (210) is coupled to the first internal node (402) via the fourth transistor (214); the second storage node (212) is coupled to the second internal node (404) via the fifth transistor (216); the first internal node (402) is coupled to a first bit line (BL) via a sixth transistor (406); the second internal node (404) is coupled to a second bit line (BLB) via a seventh transistor (408); and the control circuit (224) is adapted to deactivate the sixth and seventh transistors during coupling of the first nonvolatile memory cell to the first and second storage nodes.
    [0010]
    The memory array of claim 9, further comprising: a second volatile memory cell having third and fourth inverters (206,208) cross-coupled between third and fourth storage nodes (210,212); third storage node being coupled to the first internal node (402) through an eighth transistor (214) and the fourth storage node coupled to the second internal node (404) via a ninth transistor (216); and a second non-volatile memory cell comprising: at least one resistive element (218, 218A, 218B) programmable to take one of at least two resistive states (Rmin, Rmax); a third input node (221) connected to the first internal node (402); and a fourth input node (222) connected to the second internal node (404).
    [0011]
    The memory array of any one of claims 1 to 10, further comprising a read / write circuit (223) adapted to read in the first nonvolatile memory cell a programmed resistive state representing a first data bit and writing the first data bit into the first volatile memory cell.
    [0012]
    The memory array of any one of claims 1 to 11, wherein each of the volatile memory cells (202) is coupled to a voltage supply rail (610) coupled via a switch ( 612) at a supply voltage level (VDD).
    [0013]
    Memory matrix according to any one of claims 1 to 12, wherein said at least one resistive element (218, 218A, 218B) of each of the non-volatile memory cells (204) is of one of the following types : a spin transfer torque element having anisotropy in the plane; A spin transfer torque element having anisotropy perpendicular to the plane; and a redox element (RedOx).
    [0014]
    A method of saving data in the memory array of any one of claims 1 to 13, the method comprising: coupling, by a control circuit (224), the first non-volatile memory cell to the first and second nodes memory device for generating a current for programming the resistive state of said at least one resistive element. 30
    [0015]
    A method of restoring data in the memory array of any one of claims 1 to 13, the method comprising: reading in the first non-volatile memory cell a programmed resistive state representing a first data bit; andB13004 - BD14825 - D106608-01 27 write the first data bit into the first volatile memory cell.
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    同族专利:
    公开号 | 公开日
    US9640257B2|2017-05-02|
    US20160329098A1|2016-11-10|
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    EP3092646A1|2016-11-16|
    WO2015104299A1|2015-07-16|
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    法律状态:
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    2017-01-31| PLFP| Fee payment|Year of fee payment: 4 |
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    2021-10-08| ST| Notification of lapse|Effective date: 20210905 |
    优先权:
    申请号 | 申请日 | 专利标题
    FR1450198A|FR3016466B1|2014-01-10|2014-01-10|METHOD AND CIRCUIT FOR PROGRAMMING NON-VOLATILE MEMORY CELLS OF A VOLATILE / NON-VOLATILE MEMORY MATRIX|FR1450198A| FR3016466B1|2014-01-10|2014-01-10|METHOD AND CIRCUIT FOR PROGRAMMING NON-VOLATILE MEMORY CELLS OF A VOLATILE / NON-VOLATILE MEMORY MATRIX|
    EP15700434.2A| EP3092646B1|2014-01-10|2015-01-07|Method and circuit for programming non-volatile memory cells of a volatile/non-volatile memory array|
    PCT/EP2015/050179| WO2015104299A1|2014-01-10|2015-01-07|Method and circuit for programming non-volatile memory cells of a volatile/non-volatile memory array|
    US15/110,717| US9640257B2|2014-01-10|2015-01-07|Method and circuit for programming non-volatile memory cells of a volatile/non-volatile memory array|
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